Fluid Control
HORIBA have developed a line-up of fluid control, vaporization, analytical equipment and measuring systems tailored to every stage of the semiconductor, FPD manufacturing process, and the other wide range of manufacturing process. In all stages, from materials evaluation through to final inspection, HORIBA products will help maintain high efficiency in your process.
Our products include Mass Flow Controllers and Mass Flow Meters including High Temperature Mass Flow and Liquid Mass Flow. Liquid Automatic Refill Systems, Liquid Vaporizers, Mixed Injection Systems and Gas Concentration Monitors.
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This leading-edge pressure insensitive mass flow module is installed with differential pressure detection and a piezo actuator valve.
The high level of performance provided by the CRITERION D500 ensures it can be used for a range of advanced semiconductor manufacturing processes; pressure insensitive, multi-range/multi-gas/multi-pressure, G-LIFE (Gas Law check of Integrated Flow restrictor Equation) Self-Diagnosis function, high accuracy, fast response, wide range, and all-metal.
moreThe MV-2000 Series achieves stable vaporization, even at low temperatures, using the new tornado flow method. This is suitable for vaporization a range of liquids even challenging sources such as "High-k", a liquid source which is pyrolyzed easily.
moreThe HORIBA CS-700 chemical concentration monitor enables high performance measurement of the individual chemical constituents of complex chemistries used in the leading edge Semiconductor Manufacturing Processes.
By improving HORIBA's renowned spectroscopic measurement technology, the CS-700 realizes up to 5X improvement in measurement performance.
Provides enhanced quality control which improves the Semiconductor Manufacturing Processes.
High stability measurement dissolved oxygen in low concentration HF. Automatically switches between three measurement ranges from μg/L to mg/L. Measurement range : 0 - 20.00 mg/L.
moreThe HORIBA PR-PD2HR Particle Detection System inherits it's high-performance functions from the reticle/mask particle detection PD series which is proud of its high availability and long-term stability. At the same time also increasing the S/N ratio by more than three times and dramatically improving operating sensitivity.
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Supports Advanced Gas Flow Control Needed for Miniaturization of Semiconductors
　　
HORIBA, an OEM of instruments and measurement systems, has secured a prestigious iF DESIGN AWARD 2018, in the ‘Product Design’ discipline, with its VG...
Ideal for hydrofluoric acid monitoring in semiconductor manufacturing Hydrofluoric Acid Monitor
Pressure Insensitive Mass Flow Module
Stand-alone Type Chemical Concentration Monitor
Multi-point Chemical Solution Monitor
High-speed response and compact chemical solution concentration monitor SC-1 Monitor,
BHF Concentration Monitor
High-speed response and compact chemical solution concentration monitor TMAH/H2O2 Monitor
SPM Monitor
FPM Monitor
HF/HNO3 Monitor
Fiber Optic Type Chemical Concentration Monitor
High Precision, High Stability Chemical Concentration Monitor
Exhaust Pressure Controller
Optical Emission Spectroscopy Etching End-point Monitor
POCl3 Auto Refill System
Wafer Back Side Cooling System
Carbon Sensor Conductivity Meter (Low concentration type)
Industrial resistivity meter
Citric Acid Monitor
KOH Monitor
Wide range TMAH Concentration Monitor
High Precision TMAH Concentration Monitor
Carbon Sensor Conductivity Meter (High concentration type)
Carbon Sensor Conductivity Meter
Carbon Sensor Resistivity Meter
2-Channel Resistivity Meter
TMAH Conductivity Meter. Perfect for Controlling TMAH Developer Concentrations
Dissolved Oxygen Monitor in Low Concentration
In-line Sensor & Auto Range Switching Concentration Monitor
HF / HCl Concentration Monitor
Low Concentration Type HF/HCl/NH3 Concentration Monitor
2-channel High Precision HF Concentration Monitor
Industrial pH meter
Dissolved Ozone Monitor
H2O2 Monitor
Gas Monitor for Chamber Cleaning End Point Monitoring
Vapor Concentration Monitor
High-grade type Gas Monitor for Chamber Cleaning End Point Monitoring
Large Flow Liquid Source Vaporization Control System
Real Time Interferometric Process Monitor [CCD] Laser Interference Camera
Digital Liquid Mass Flow Meters / Controllers
Compact Baking System
Liquid Auto Refill System
Mixed Injection System Liquid Vaporizers
Compact Process Gas Monitor
Mixed Gas Generators MU Series
Mixed Injection System Liquid Vaporizer
Reticle/Mask Particle Detection System
Blanks Mask Particle Detection System
Reticle / Mask Particle Detection System
Compact Reticle/Mask Particle Detection System
Low-cost Reticle/Mask Particle Detection System
Piezo Actuator Valve
Reticle/Mask Particle Remover
Plasma Emission Controller
Semiconductor process monitoring for SC-2 process
Mass flow controllers
High Temperature Digital Mass Flow Controller
Mass Flow Controller
Digital Mass Flow Controller
Digital Mass Flow Controller
Multi Range/Multi Gas Digital Mass Flow Controller
Pressure Insensitive Mass Flow Controller
Highly Sensitive Silica Monitor
Test Gas Generation Systems
Micro Volume pH Monitor
Digital Automatic Pressure Regulator
Direct Liquid Injection System
Capacitance Manometer
Digital Liquid Mass Flow Meters
