HORIBA have developed a line-up of fluid control, vaporization, analytical equipment and measuring systems tailored to every stage of the semiconductor, FPD manufacturing process, and the other wide range of manufacturing process. In all stages, from materials evaluation through to final inspection, HORIBA products will help maintain high efficiency in your process.
Our products include Mass Flow Controllers and Mass Flow Meters including High Temperature Mass Flow and Liquid Mass Flow. Liquid Automatic Refill Systems, Liquid Vaporizers, Mixed Injection Systems and Gas Concentration Monitors.
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This leading-edge pressure insensitive mass flow module is installed with differential pressure detection and a piezo actuator valve.
The high level of performance provided by the CRITERION D500 ensures it can be used for a range of advanced semiconductor manufacturing processes; pressure insensitive, multi-range/multi-gas/multi-pressure, G-LIFE (Gas Law check of Integrated Flow restrictor Equation) Self-Diagnosis function, high accuracy, fast response, wide range, and all-metal.more
The MV-2000 Series achieves stable vaporization, even at low temperatures, using the new tornado flow method. This is suitable for vaporization a range of liquids even challenging sources such as "High-k", a liquid source which is pyrolyzed easily.more
The HORIBA CS-700 chemical concentration monitor enables high performance measurement of the individual chemical constituents of complex chemistries used in the leading edge Semiconductor Manufacturing Processes.
By improving HORIBA's renowned spectroscopic measurement technology, the CS-700 realizes up to 5X improvement in measurement performance.
Provides enhanced quality control which improves the Semiconductor Manufacturing Processes.
High stability measurement dissolved oxygen in low concentration HF. Automatically switches between three measurement ranges from μg/L to mg/L. Measurement range : 0 - 20.00 mg/L.more
The HORIBA PR-PD2HR Particle Detection System inherits it's high-performance functions from the reticle/mask particle detection PD series which is proud of its high availability and long-term stability. At the same time also increasing the S/N ratio by more than three times and dramatically improving operating sensitivity.more
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