Wet Etching is an etching process that utilizes liquid chemicals or etchants to remove materials from the wafer, usually in specific patterns defined by photoresist masks on the wafer. Materials not covered by these masks are 'etched away' by the chemicals while those covered by the masks are left almost intact. These masks were deposited on the wafer in an earlier wafer fab step known as 'lithography.'
A simple wet etching process may just consist of dissolution of the material to be removed in a liquid solvent, without changing the chemical nature of the dissolved material. In general, however, a wet etching process involves one or more chemical reactions that consume the original reactants and produce new species.
Stand-alone Type Chemical Concentration Monitor
Fiber Optic Type Chemical Solution Concentration Monitor
Fiber Optic Type Chemical Concentration Monitor
High Precision, High Stability Chemical Concentration Monitor
Non-Contact Chemical Concentration Monitor
HF (Hydrofluoric Acid) DO (Dissolved Oxygen) Monitor / Pure Water DO (Dissolved Oxygen) Monitor
Carbon Sensor Conductivity Meter (Low concentration type)
Resistivity Meter for Semiconductor Cleaning Processes
Citric Acid Monitor
Carbon Sensor Conductivity Meter (High concentration type)
Carbon Sensor Conductivity Meter
KOH Monitor
High Precision TMAH Concentration Monitor
Flat Carbon Sensor Conductivity Meter
Carbon Sensor Resistivity Meter
2-Channel Resistivity Meter
In-line Sensor & Auto Range Switching Concentration Monitor
HF / HCl Concentration Monitor
Low Concentration Type HF/HCl/NH3 Concentration Monitor
Industrial pH meter
Dissolved Ozone Monitor
H2O2 Monitor
Low Concentration Monitor- Sulfuric Acid/Hydrogen Peroxide
Highly sensitive silica monitor for ultra-pure water management in semiconductor/FPD processes
Micro Volume pH Monitor
Affordable Benchtop Raman Spectrometer
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