Reticle/Mask Particle Remover

The RP-1 automatically removes particles from the reticle/mask by air (or N2) and vacuum suction. Routinely removing the particles before the lithography process extends the replacement cycle of the pellicle and cleaning cycle of the mask, thereby contributing to a reduction in running costs. 

Segment: Semiconductor
Abteilung: Metrology
Produktionsfirma: HORIBA, Ltd.
  • Reduces operator routine work and prevents human damage to pellicles
  • Eliminates human handling and prevents electrostatic discharge damage
  • Removal of particles before and after storage in the reticle stocker extends the duration of the mask life



  • In combination with the Reticle/Mask Particle Detection System PR-PD Series, the state of the reticle/mask after removal of particles can be confirmed.
Applicable caseNikon/Canon/SMIF POD/HORIBA
ThroughputSimultaneously blows the glass and pellicle surfaces to remove particles approximately for 1 min.
Dimensions1190(D) x 1150(W) x 1520(H)mm


Sie haben Fragen oder Wünsche? Nutzen Sie dieses Formular, um mit unseren Spezialisten in Kontakt zu treten. * Diese Felder sind Pflichtfelder.

Related products

Partica LA-960V2
More Partica LA-960V2

Laser Scattering Particle Size Distribution Analyzer

Partica mini LA-350
More Partica mini LA-350

Laser Scattering Particle Size Distribution Analyzer

PD Xpadion
More PD Xpadion

Reticle / Mask Particle Detection System

PR-PD3 Pro
More PR-PD3 Pro

Reticle / Mask Inspection System

ViewSizer 3000
More ViewSizer 3000

Multi-Laser Nanoparticle Tracking Analysis (NTA)