RP-1

Reticle/Mask Particle Remover

The RP-1 automatically removes particles from the reticle/mask by air (or N2) and vacuum suction. Routinely removing the particles before the lithography process extends the replacement cycle of the pellicle and cleaning cycle of the mask, thereby contributing to a reduction in running costs. 

Segment: Semiconductor
Division: Metrology
Manufacturing Company: HORIBA, Ltd.
  • Reduces operator routine work and prevents human damage to pellicles
  • Eliminates human handling and prevents electrostatic discharge damage
  • Removal of particles before and after storage in the reticle stocker extends the duration of the mask life

 

  
           

  • In combination with the Reticle/Mask Particle Detection System PR-PD Series, the state of the reticle/mask after removal of particles can be confirmed.
Applicable caseNikon/Canon/SMIF POD/HORIBA
ThroughputSimultaneously blows the glass and pellicle surfaces to remove particles approximately for 1 min.
Dimensions1190(D) x 1150(W) x 1520(H)mm

Request for Information

Do you have any questions or requests? Use this form to contact our specialists.

* These fields are mandatory.

Related products

ANALYSETTE 28 ImageSizer*
ANALYSETTE 28 ImageSizer*

Dynamic Image Analysis

Eyecon2™*
Eyecon2™*

Direct Imaging Particle Analyzer

nanoPartica SZ-100V2 Series
nanoPartica SZ-100V2 Series

Nanoparticle Analyzer

Partica LA-960V2
Partica LA-960V2

Laser Scattering Particle Size Distribution Analyzer

Partica mini LA-350
Partica mini LA-350

Laser Scattering Particle Size Distribution Analyzer

PD10
PD10

Reticle / Mask Particle Detection System

PSA300*
PSA300*

Static Image Analysis System Particle Size

SA-9600 Series
SA-9600 Series

BET Flowing Gas Surface Area Analyzers

SA-9650 Series
SA-9650 Series

BET Surface Area Analyzers

ViewSizer 3000
ViewSizer 3000

Simultaneous Multi-Laser Nanoparticle Tracking Analysis (NTA)