Reticle/Mask Particle Remover RP-1

Reticle/Mask Particle Remover RP-1

The RP-1 automatically removes particles from the reticle/mask by air (or N2) and vacuum suction. Routinely removing the particles before the lithography process extends the replacement cycle of the pellicle and cleaning cycle of the mask, thereby contributing to a reduction in running costs. 

 

Segment: Semiconductor
Division: Metrology
Base product
Manufacturing Company: HORIBA Ltd.
  • Reduces operator routine work and prevents human damage to pellicles
  • Eliminates human handling and prevents electrostatic discharge damage
  • Removal of particles before and after storage in the reticle stocker extends the duration of the mask life

 

  
           

  • In combination with the Reticle/Mask Particle Detection System PR-PD Series, the state of the reticle/mask after removal of particles can be confirmed.
Applicable caseNikon/Canon/SMIF POD/HORIBA
ThroughputSimultaneously blows the glass and pellicle surfaces to remove particles approximately for 1 min.
Dimensions1190(D) x 1150(W) x 1520(H)mm
Reticle/Mask Particle Removal Lithography Process in Semiconductor Manufacturing Process
Reticle/Mask Particle Removal Lithography Process in Semiconductor Manufacturing Process

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