RP-1

Reticle/Mask Particle Remover RP-1

Reticle/Mask Particle Remover

The RP-1 automatically removes particles from the reticle/mask by air (or N2) and vacuum suction. Routinely removing the particles before the lithography process extends the replacement cycle of the pellicle and cleaning cycle of the mask, thereby contributing to a reduction in running costs. 

 

Segment: Semiconductor
Division: Metrology
Manufacturing Company: HORIBA, Ltd.
  • Reduces operator routine work and prevents human damage to pellicles
  • Eliminates human handling and prevents electrostatic discharge damage
  • Removal of particles before and after storage in the reticle stocker extends the duration of the mask life

 

  
           

  • In combination with the Reticle/Mask Particle Detection System PR-PD Series, the state of the reticle/mask after removal of particles can be confirmed.
Applicable caseNikon/Canon/SMIF POD/HORIBA
ThroughputSimultaneously blows the glass and pellicle surfaces to remove particles approximately for 1 min.
Dimensions1190(D) x 1150(W) x 1520(H)mm

Request for Information

Do you have any questions or requests? Use this form to contact our specialists. * These fields are mandatory.

Related products

Gratings - OEM Diffraction Grating
More Gratings - OEM Diffraction Grating

OEM gratings design and production capabilities

PR-PD2
More PR-PD2

Reticle/Mask Particle Detection System

PR-PD2BLI
More PR-PD2BLI

Blanks Mask Particle Detection System

PR-PD2HR
More PR-PD2HR

Reticle / Mask Particle Detection System

PR-PD3
More PR-PD3

Compact Reticle/Mask Particle Detection System

PR-PD5
More PR-PD5

Low-cost Reticle/Mask Particle Detection System