Industrial Process

Optical spectroscopic techniques are very sensitive and powerful. They are noninvasive, nondestructive, and can be used in-situ or remotely through fiber optic probes. Presently these techniques are used in a broad range of industrial applications. The list below is just a sampling of current classes of applications and the type of information that can be obtained. The following analytical and instrumental techniques are used in Industrial Processes, please click on the squares for further information.


Drying / Hydration






Headspace in Vials / Reactors



High Throughput Screening / Multiwell Assays


In-Situ Depth Control of Deposition Processes



In-Situ Thin Film Monitoring and Control






Plasma Etch Advanced Process Control



Plasma Etch Depth Control (1-5 µm)



Plasma Etch Interface Detection



Plasma Monitoring and Endpoint Detection



Polymerization / Extrusion





Raw and Bulk Material Feeds



Reactor Monitoring


Slurries and Suspensions



Solutions / Reaction Mixes


Thin Film Growth or Etch Monitoring



Vessel Cleaning Effluents