Presented by: Dr. Matthieu Chausseau, Product manager, HORIBA Scientific
X-Ray Fluorescence (XRF), Scanning Electron Microscopy (SEM) and X-ray Photoelectron Spectroscopy (XPS) are widely used for the characterization of materials in research laboratories. Both techniques are providing useful information on materials, helping scientists to move forward in their research, but they also face some limitations. Glow Discharge Optical Emission Spectroscopy (GD-OES) underwent multiple evolutions over the past years making it suitable for the characterization of advanced materials and it helps to overcome some of the limitations and drawbacks of XRF, SEM and XPS. GD-OES can also be used as a complementary tool and synergies exist.
We will introduce the GD-OES technique and features that help to overcome limitations and drawbacks: direct depth measurement without sample preparation, ability to characterize inorganic and organic layers, pulsed RF for the characterization of fragile materials, depth profiling from the first nanometers down to 150 µm in minutes. We will also introduce the work done by research scientists showing how GD-OES, XRF, SEM and XPS can be used as complementary tools.