discontinued This product has been discontinued and is no longer available. You can still access this page for informational service purposes.

UVISEL 2 VUV

UVISEL 2 VUV HORIBA

A versatile spectroscopic ellipsometer covering a large range from VUV to NIR

 

A versatile spectroscopic ellipsometer covering a range from VUV to NIR

The UVISEL 2 VUV is a new generation of phase modulation ellipsometer for VUV measurements. It is the only spectroscopic ellipsometer on the market designed to deliver the fastest thin film measurements over the largest wavelength range, from 147 to 2100 nm.

The UVISEL 2 VUV is “a hybrid ellipsometer”, capable of operating in 2 modes: under nitrogen or primary vacuum. Its mechanical design is optimized for low nitrogen consumption down to 6L/min, and allows for fast sample loading, which takes less than two minutes. The readily accessible chamber in front makes sample loading very convenient.

The UVISEL 2 VUV provides high sensitivity at VUV wavelengths. It integrates dual high power energy sources, high throughput optics, a CaF2 photo-elastic modulator and two modern monochromators. Sample measurement takes less than 8 minutes from 147 to 850 nm with an excellent signal to noise ratio.

The UVISEL 2 VUV revolutionizes the world of VUV ellipsometers by significantly reducing the nitrogen consumption and the time it takes to purge and measure samples.

The well-known DeltaPsi2 software controls the UVISEL 2 VUV ellipsometer, offering powerful acquisition, modelling and reporting features. The user interface is intuitive and suitable for both research and industrial use.

The UVISEL 2 VUV provides unmatched measurement speed and low operating costs, making it the ideal ellipsometer for the characterization of numerous thin film applications from 147 to 2100 nm. The UVISEL 2 VUV ellipsometer can be customized and automated for production.

 

 

Segment: Scientific
Manufacturing Company: HORIBA France SAS
  • Fast sample loading
  • Fast purging
  • Lowest nitrogen consumption
  • Very fast measurement
  • Two modes of operation: under nitrogen or primary vacuum

 

 

High-k Dielectric with Nanoscale Thickness Studied by Spectroscopic Ellipsometry and FTIR-ATR
High-k Dielectric with Nanoscale Thickness Studied by Spectroscopic Ellipsometry and FTIR-ATR
High-k dielectrics are under investigation to replace the conventional SiO2 or SiOxNy gate dielectric in many applications of Complementary Metal Oxide Semiconductor (CMOS) devices. Hafnium aluminium oxides (HfAlO) were investigated in this study as they fulfill the physical properties required for such applications. The structure and composition of hafnium aluminate films as well as the HfAlO / Si interface play a very important role for the optimization of CMOS devices. For this study complementary optical techniques were used. VUV Spectroscopic ellipsometry and infrared spectroscopy (FTIR-ATR) provide accurate characterization of thin film thickness and optical properties near and above the bandgap.

Request for Information

Do you have any questions or requests? Use this form to contact our specialists.

* These fields are mandatory.

Product accessories

Related products

Auto SE
Auto SE

Spectroscopic Ellipsometer for Simple Thin Film Measurement

EMGA-Expert
EMGA-Expert

Oxygen/Nitrogen/Hydrogen Analyzer
(Flagship High-Accuracy Model)

EMGA-Pro
EMGA-Pro

Oxygen/Nitrogen Analyzer (Entry Model)

GD-Profiler 2™
GD-Profiler 2™

Discover a Whole New World of Information with Glow Discharge Optical Emission Spectrometer

GDOES Software
GDOES Software

Quantum and Image

LabRAM Odyssey
LabRAM Odyssey

Confocal Raman Imaging & High Resolution Spectrometer

LabRAM Soleil
LabRAM Soleil

Multimodal Confocal Raman Microscope

Smart SE
Smart SE

Powerful and Cost Effective Spectroscopic Ellipsometer

UVISEL Plus
UVISEL Plus

Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm

XploRA™ PLUS
XploRA™ PLUS

Raman Spectrometer - Confocal Raman Microscope

Auto SE
Auto SE

Spectroscopic Ellipsometer for Simple Thin Film Measurement

Auto Soft
Auto Soft

Intuitive Auto-Soft Interface for the Auto SE and Smart SE

DeltaPsi2 Software
DeltaPsi2 Software

A Platform for HORIBA Scientific Ellipsometers

LEM Series
LEM Series

Camera Endpoint Monitor based on Real Time Laser Interferometry

MESA-50
MESA-50

X-Ray Fluorescence Analyzer

MESA-50K
MESA-50K

X-Ray Fluorescence Analyzer

Methods
Methods

Recall settings, and automate processes

Script and ActiveX
Script and ActiveX

Customize with VBS

Smart SE
Smart SE

Powerful and Cost Effective Spectroscopic Ellipsometer

UVISEL Plus
UVISEL Plus

Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm

XGT-9000
XGT-9000

X-ray Analytical Microscope (Micro-XRF)

XGT-9000SL
XGT-9000SL

X-ray Analytical Microscope
with a Super Large Chamber

Auto SE
Auto SE

Spectroscopic Ellipsometer for Simple Thin Film Measurement

Smart SE
Smart SE

Powerful and Cost Effective Spectroscopic Ellipsometer

UVISEL Plus
UVISEL Plus

Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm