GD-Profiler 2™

Discover a Whole New World of Information with Glow Discharge Optical Emission Spectrometer

The GD-Profiler 2™ provides fast, simultaneous analysis of all elements of interest including the gases nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin and thick films characterization and process studies.

Equipped with an RF source that can operate in pulsed mode for fragile samples, the range of applications of the GD-Profiler 2™ goes from corrosion studies to PVD coating process control, from thin film PV development to LED Quality Control and it is used in Universities as well as in Industrial Research laboratories.

Segment: Scientific

Division: Elemental Analysis

Manufacturing Company: HORIBA France SAS

RF-Only generator is Class E standard and optimized for stability and crater shape allowing for real surface analysis.
Source can be pulsed with synchronized acquisition for optimum results on fragile samples. The use of an RF source allows analysis of conventional and non conventional layers and materials.
Simultaneous optic provides full spectral coverage from 110 to 800nm, including deep UV access to analyze H, O, C, N and Cl.
HORIBA original, ion-etched holographic gratings assure the highest light throughput and resolution for maximum light efficiency and sensitivity.
Patented HDD detection provides speed and sensitivity in detection without compromise.
On line measurement of crater depth and erosion rate with patented built in Interferometer. DIP.
Easily accessible sample compartment allows plenty of room for sample loading.
Powerful QUANTUM™ software with Tabler report writing tool.
CenterLite laser pointer (patent pending) for precise sample loading.

Monochromator option available only from HORIBA provides the perfect tool to increase instrument flexibility while adding "n+1" capability.

Combination of a powerful Glow Discharge source with Ultra-Fast High Resolution simultaneous optics for fast Elemental Depth Profile Analysis of conductive, non-conductive and hybrid materials.

For thin & thick films – from nanometre to hundreds of microns with nanometer depth resolution.

Typical domains of applications include PV, metallurgy, LED manufacturing, corrosion studies, organic and micro-electronics, materials research & development, deposition processes optimisation, PVD, CVD, plasma coatings, automotive, Li batteries, etc

No UHV required.

Measurement of all elements of interest (including H, D, O, Li, Na, C, N etc) with patented High Dynamic Detectors.

Optional monochromator with Image mode and high Dynamic detection for full spectrum record and total flexibility.

Pulsed RF Source for operation in RF and pulsed RF modes with auto-matching

Differential double pumping of the source for patented SEM sample preparation

Plasma Cleaning function built in

Patented UFS for Ultra-Fast Sputtering of polymeric and organic materials

Patented DIP – built in interferometer for direct on line depth measurement

Various anode diameters and accessories for odd shape samples

Windows 10 software – Multiple copies provided for remote installations

This application note describes the method and conditions to use with the EMIA 820V C/S analyzer to measure cement.

Pulsed RF GDOES for the analysis of films containing metal and metal oxide nanoparticles

Features and Benefits of Pulsed RF GD OES for the Characterisation of Electrodes of Li-ion Batteries.

A Li-ion battery is a rechargeable battery in which lithium ions move between the anode and the cathode creating an electricity flow. Whether you study new electrodes or coatings behaviors, charge and discharge processes, process controls, or perform comparative studies for Li-ion batteries, Pulsed RF Glow Discharge Optical Emission Spectrometry is a valuable companion tool.

H&D Measurement of Hydrogen (and Deuterium) by RF GDOES

RF GD OES is well known for ultra fast elemental depth profile of thin and thick films. All elements can be measured including Hydrogen (H) which is important in many application fields - for corrosion studies, for PV, in metallurgy, for the development of hydrogen storage materials and for all polymeric coatings studies to name a few. The most sensitive emission line for H is in the VUV range at 121,567 nm.

GDOES, the Analytical Companion Tool for Magnetron Sputtering Deposition

Pulsed RF GDOES is a companion analytical tool for magnetron sputtering deposition. Magnetron sputtering is a type of Plasma Vapour Deposition. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon. By applying a high voltage (RF, HIPIMS etc), a glow discharge is created, resulting in acceleration of ions to the target surface and a plasma coating. The argon-ions will eject sputtering materials from the target surface (sputtering), resulting in a sputtered coating layer on the products in front of the target.

Examples of application of pulsed RF GDOES to the analysis of polymer layers and organic/inorganic films have been show illustrating the possibilities of the technique. Thanks to the use of pulsed RF source and UFS, GDOES takes its role in the multidimensional characterization of advanced multilayered organic materials where its specific strong points (speed, ease of use, large observation zone, measurement of all elements) are of great interest.

Do You Know What is Protecting Your Telephone Screen

Optimization and follow up of manufacturing process of plastics films are easily achieved using Pulsed RF Glow Discharge Optical Emission Spectrometry. This technique allows the fast detection of defects and presence of contaminants. The GD Profiler 2 can be a key instrument during the optimization and follow up of manufacturing process. Indeed, GDOES is a fast technique which allows the easy comparison of different materials, the detection of defects and the presence of contaminants. Moreover, combined with the «UFS» system, it proves to be a flexible technique for organic and hybrid materials opening numerous new applications domain.

Pulsed RF Glow Discharge Optical Emission Spectrometry, coupled with the Ultra Fast Sputtering system, offers the Ultra Fast Elemental Depth Profiling of plastic thin films Polymer Mobile Screen Protection Covers. By coupling this technique with the Raman spectroscopy z-Scan analysis it is possible to acquire important information concerning the fabrication of smartphone screen protectors.

GD Profiler 2 Brochure eA fr

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GDOES DiP Brochure

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