X-ray Analytical Microscope
The evolution of μXRF! Combination of improved sensitivity and new imaging technology achieved high speed analysis of foreign materials in only one unit.
Highlighting a certain element as a characteristic point simplifies detection of foreign material, obstacles, etc.
Foreign material is detected quickly through high-speed screening and highlighting through imaging processing. Additionally, the high resolution X-ray beam enables detailed analysis of elements contained in foreign material. This series of foreign material analyses can be completed with a single unit, up to the level of several ten μm.
■ Analysis of Foreign Material in Films
Even difficult to visually confirm foreign materials can be detected and analyzed while checking optical observation images with high resolution of them after elemental mapping screening.
■ Analysis of Hydrous Samples
Enables measurement of hydrous samples and foreign materials can be detected through image processing.
|Instrument||X-ray fluorescence analytical microscope|
|Sample type||Solids, Liquids, Particles|
|Detectable elements||F － Am|
|Chamber size||450(W) x 500(D) x 80(H)||1030(W) x 950(D) x 500(H)|
|Maximum sample size||300(W) x 250(D) x 80(H)||500(W) x 500(D) x 500(H)|
|Maximum mass of sample||1 kg||10 kg|
|Optical observation||Two high resolution cameras with objective lens|
|Optical design||Vertical-Coaxial X-ray and Optical observation|
|Sample illumination/observation||Top, Bottom, Side illuminations/Bright and Dark fields|
|Voltage||Up to 50 kV|
|Current||Up to 1 mA|
|Number of probes||Up to 4|
|Primary X-ray filters for spectrum optimization||5 positions|
|X-ray Fluorescence detector||Silicon Drift Detector (SDD)|
|Mapping area||100 mm x 100 mm||350 mm x 350 mm|
|Step size||2 mm||4 mm|
|Sample environment||Full vacuum / Partial vacuum /|
|Partial vacuum / Ambient condition*|
* Detectable elements for SL version are from Na to Am
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