PD10-EX
Reticle / Mask Particle Detection System
Complete particle detection and removal with one machine for enhanced efficiency and yield improvement in semiconductor manufacturing processes
Since its launch in 1984, the PD series of particle detection systems, indispensable to the semiconductor lithography process, has continued to evolve in response to customers’ needs and this year marks its 40th anniversary.
The new product "PD10-EX" is based on the popular conventional model "PD10" and is equipped with a particle removal function, making it possible to complete detection and removal with one device.
Furthermore, we have developed an in-house unit that supports automatic reticle/mask transport, contributing to more efficient semiconductor manufacturing processes and higher yields.
Analysis, measurement, and control needs in the semiconductor industry are changing at an unprecedented pace, becoming more sophisticated and diverse. We are working on expanding the functionality of the PD10-EX so that it can perform one-stop analysis of particle composition and measurement of pellicle※1 film thickness, and we will continue to present new possibilities in the future.
Selection of countries and territories where this product is available:
China,Germany,Ireland,Israel,Italy,Korea (South),Malaysia,Singapore,Taiwan,United Kingdom,United States
View the complete list
here.
1. Improve work efficiency and yield by integrating particle detection and removal processes
The functions of our Reticle/Mask Particle Remover "RP-1," which boasts a particle removal rate of over 95%※2, have been integrated with "PD10".
This makes it possible to automatically detect and remove particles. It is also equipped with a multi-port that allows two cases containing reticles/masks to be set at the same time, allowing continuous particle detection and removal.
2. Promote automation and labor savings in the manufacturing process by linking with automatic conveyance equipment
We developed our own EFEM (Equipment Front End Module: a unit that transfers the reticle/mask between the OHT※3 and the particle detection system that requires interfacing with an OHT system) used in a semiconductor manufacturing factory. We respond flexibly to customer specifications and contribute to automation and labor savings - critical for improving productivity, eliminating labor shortages, and streamlining manufacturing areas.
※1 Dust-proof film to prevent particles from adhering to the patterned surface of the reticle/mask
※2 Results from an in-house test with 5μm glass beads attached to the glass surface. Effects may vary depending on usage and conditions.
※3 Overhead Hoist Transport: an automatic transport device that holds transported objects in a suspended state and runs on track rails installed on the ceiling
