Semiconductor Process
Material Analysis
Silicon crystal is widely used in semiconductors. The PHOTOLUMINOR-D has been designed especially for quantitative impurity analysis of silicon crystals with high sensitivity.
The application of photoluminescence for the quality...
The PHOTOLUMINOR-S has been designed for R&D in many applications and provides high performance and easy operation. High-sensitivity measurement is important for detecting weak photoluminescence...
MR-VS series are new special instruments for spectrum measurement which employ compact spectrograph and optical fiber.
Easy measurement of cathodoluminescence spectrograph by mounting to SEM.
MP-32S/M requires SEM as excitation source and it can evaluate defects, impurities and crystalline construction in micro region.
Lithography Process
Achieves dramatic cost reductions in advanced mask inspections
Low running costs thanks to a compact design, plus remarkable versatility
For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.
DI Water Analysis (Wet Process)
Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).
This resistivity meter is ideal for such applications as the high-precision water monitoring employed at ultra-pure water plants used in semiconductor manufacturing.
They utilize newly designed, high-precision, high-stability temperature measurement circuitry and a vastly improved temperature compensation function, an important element for measuring the resistivity of ultra-pure water.
Material Analysis (Particulates Analysis & Defect Analysis)
High spectral resolution analytical Raman microscope for ultimate performance and flexibility; includes UV Raman configuration, full automation and wide range of accessories.
The GD-Profiler 2™ provides fast, simultaneous analysis of all elements of interest including the gases nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin film characterization and process studies.
Chemical Analysis (Wet Process)
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.
High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices
High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes
24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes
High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices
Ideal for hydrofluoric acid monitoring in semiconductor manufacturing
Ideal for ozone fluid density control in semiconductor production processes
This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.
High precision liquid mass flow controller using the sensor with a unique cooling method. Can control from micro-liter to ultra low flow rate.
Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm
Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm
Compact resistivity meter for versatile porpose. Measurement range: 0 - 100.0 MΩ・cm
The HE-480H industrial conductivity meter is a high-concentration conductivity meter using a four-electrode method, with a wide measurement range of 0 - 50 S / m. It is suitable for a wide range of tasks, from managing the concentration of all types of medicinal solutions, to managing the concentration of liquid fertilizers used in hydroponic farming.
The HE-480C industrial conductivity meter is a low-concentration conductivity meter using a two-electrode method.
This is a highly functional model, with high-performance temperature compensation, and is applicable to a wide range of tasks, from managing pure water for use with semiconductors, to managing the quality of boiler water.
HE-960TM offers High precision measurement of the conductivity of TMAH (Tetra Methyl Ammonium Hydroxide) solutions.
High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.
Gas Control/Analysis (Dry Process)
The best-selling digital mass flow controller offering multi range/multi gas solutions. High accuracy, fast response, and compact size. All metal.
The UR series automatic pressure regulators are electronic regulators with high-precision pressure sensors and ...
Best-selling, compact baking system suitable for a range of liquid source delivery applications. Easy maintenance.
The compact vaporization system does not require carrier gas, it can be used with either a liquid or gas flow meter, allowing for easy integration for direct liquid injection.
Automatic liquid refill system delivers chemicals directly to baking or direct liquid injection systems. Safe, efficient, and continuous supply of liquid sources.
A best-seller mass flow controller for high temperature environments
High stability and accuracy pressure controller for back side wafer cooling in semiconductor manufacturing, installed piezo actuator valve and pressure sensor.
Vaporize liquid source stably by the gas-liquid mixture vaporization method. Can be used for low temperature and large flow production.
Process Monitoring (Dry Process)
Compact process gas monitor using quadrupole mass spectrometer. Monitors trace gases, responds quickly to process shift . Easy to install and maintain.
Thin Film Control/Analysis
Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.
Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.Interference occurs when monochromatic light hits the sample surface, resulting in...
Emission analysis type end-point monitor intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process.
Products: UVISEL Plus: 190-920 nm | NIR Option: 2100 nm
Measure thin film thickness and optical constants. The reference ellipsometer for research and process development.
CMP Process
Particle size distribution analyzers, which determine both the size of particles and their state of distribution, are used for the production control of powders in such fields as ceramics, chemistry, and foodstuffs. The LA-920,...
The LA-950 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the most popular for many applications.
The LB-550, using a dynamic light scattering technique, is able to measure very concentrated suspensions, up to 40% solids in many cases, over a size range of 1nm-6µm.
Drain Water Analysis
The IF-250 Simple Fluoride Ion Monitor for use in industry provides continuous measurements of the free fluoride ion concentration in waste water and other test samples using the fluoride ion electrode method.
The unit can be used on a range of test samples with varying concentrations from 0.0 to 10.0 mg / L up to 0 to 10,000 mg / L. This makes the IF-250 the ideal unit for monitoring the treatment of waste water and effluent resulting from the semiconductor production process, as well as electronic and glass factories using fluoride in the production process.