Surface analysis equipment using HORIBA's spectroscopic technology realizes highly accurate surface analysis that can be achieved by its precise spectroscopic analysis.
GD-OES (Glow Discharge Optical Emission Spectroscopy) is an analysis method for rapid depth profile analysis of samples that have undergone various surface treatments such as plating, heat treatment, vapor deposition, and sputtering. This is an effective analysis method for evaluating multi-layered films of compound semiconductors.
Raman spectroscopy is used to evaluate crystallinity and stress in the field of semiconductors. Raman spectra can be acquired with high resolution, and subtle differences can be discerned.
HORIBA제품의 자세한 정보를 원하시면, 아래의 양식에 내용을 입력을 부탁드립니다.