Depth profiling of organic coatings poses significant analytical challenges due to the slow and non-uniform erosion of carbon-based materials. In this application note, we introduce an innovative methodology developed and patented by HORIBA France SAS, involving the addition of oxygen to the argon plasma in GD-OES. This gas mixture promotes chemical reactions that greatly enhance sputtering efficiency and uniformity in organic layers. Applied to multilayer samples provided by Renault Group, the technique enables accurate and reproducible analysis of complex stacks containing both organic and inorganic materials. This approach is particularly valuable for applications in the automotive, aerospace, encapsulated electronics, and photovoltaic industries, where precise layer characterization is essential.
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