D700MG

High Speed & Precision Pressure Insensitive Mass Flow Module

Critical semiconductor manufacturing processes continuously desire precision gas flow control devices that enable both future innovation, and lab to fab transition of leading edge memory and logic device. HORIBA's propose the new pressure based MFC D700MG, the upper compatible model of the D500MG to support customer’s challenges.

Segment: Semiconductor

Division: Fluid Control

Manufacturing Company: HORIBA STEC, Co., Ltd.

Selection of countries and territories where this product is available:
China,Germany,Ireland,Israel,Italy,Japan,Korea (South),Malaysia,Singapore,Taiwan,United Kingdom,United States
View the complete list here.

Features
Specifications

On-Tool Gas and Full Scale Configuration Change *Only EtherCAT
- Provide flexibility to process optimization
100ms Step-up Response & MFC-to-MFC deviation control
- Deliver high productivity and greater process performance
MRMG functionality for small flow rate(Bin101 – Bin105)
- Provide flexibility to process requiring small flow rate
Better Valve Shut-off and Corrosion Resistance by PFA nozzle
- Robustness with less particle risk reduce down time and optimize yield

State Monitor Function
- Provide more internal data for smarter failure prediction

Output items of state monitor function

Flow/Pressure zero adjustment counts

Valve drive counts

Record of max/min P0,P1,P2 pressure

Record of max/min Block temperature

Total time over/below pressure spec.

Total time over/below temperature spec.

Total working time

Total control time

Total flow time (per calibration instance)

Total flow rate (per calibration instance)

Go to External Drawing

*1 Flow rate accuracy is traceable only down to 2 SCCM, hence actual gas accuracy not guaranteed below 2 SCCM.
*2 This is guaranteed value under 25 ℃ and ≤ 1.0 × 10^-3 Pa (A).
*3 Setting time is MFC output signal and N2 gas. Other detail definition follows setting time of "SEMI Standard E17-1011 Section 4.1.4".
*4 Pressure perturbation has to be smaller than 20 % pressure change per second and ±70 kPa/sec (±10 PSI/sec).
*5 EtherCAT^® is a registered trademark and patented technology, licensed by Beckhoff Automation GmbH in Germany.

*1 Flow rate accuracy and repeatability of Bin#14-15 are guaranteed only for N2 calibration gas.
*2 This is guaranteed value under 25 ℃ and ≤ 1.0 × 10^-3 Pa (A).
*3 Setting time is MFC output signal and N2 gas. Other detail definition follows setting time of "SEMI Standard E17-1011 Section 4.1.4".
*4 Pressure perturbation has to be smaller than 20 % pressure change per second and ±70 kPa/sec (±10 PSI/sec).
*5 EtherCAT^® is a registered trademark and patented technology, licensed by Beckhoff Automation GmbH in Germany.