Semiconductors are the key evolving components in the industry today. HORIBA has kept its sights keenly focused on this micro world. Specialists in each field; HORIBA have pursued proprietary engineering projects in a wide range of areas that include evaluation and analysis, purity of ultra-pure water, composition of liquids and gases, and more broadly, environment and safety. With our sights set clearly on the overall process, we have developed a line-up of analytical equipment, fluid control and measuring systems tailored to every stage of the semiconductor manufacturing process in response to stringent quality control requirements. In all stages, from materials evaluation through to final inspection, HORIBA products help maintain high efficiency in the manufacture of leading-edge electronics devices.

Featured Application

Non contact temperature measurement for:

  • A susceptor in a vacuum chamber
  • Liquid crystal substrate in FPD manufacturing process
  • Quartz substrate in polishing.

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Semiconductor Manufactuing Process

Related Products

Below you can see the different stages during the Semiconductor Manufacturing Process. Please click on each phase in order to see the products that are avaialble to you during this stage.

Lithography Process

Blanks Mask Particle Detection System PR-PD2BLI

High speed and high accuracy inspection for blanks mask

PR-PD2HR Particle detection system

Achieves dramatic cost reductions in advanced mask inspections

HORIBA's PR-PD2 Particle Detection System

High sensitive particle detection down to 0.35µm.

Compact Reticle/Mask Particle Detection System PR-PD3

Low running costs thanks to a compact design, plus remarkable versatility

PR-PD5 Particle detection system

For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.

Reticle/Mask Particle Remover RP-1

Automatically removes particles by blow and vacuum suction

DI Water Analysis

2-channel Carbon Sensor Resistivity Meter HE-960RW-GC(W)

Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm

Highly Sensitive Silica Monitor SLIA-300

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).

Material Analysis (Particulates Analysis & Defect Analysis)


El GD-Profiler 2™ proporciona un análisis rápido simultáneo de todos los elementos de interés incluyendo Na, Li, H, (Deuterio posible), O, Cl. Es la herramienta ideal para la caracterización de capas delgadas y los estudios de proceso.

LabRAM HR Evolution Raman Microscope

High spectral resolution analytical Raman microscope for ultimate performance and flexibility; includes UV Raman configuration, full automation and wide range of accessories.


Single point analysis and automated hyperspectral imaging.

Dual vacuum modes.

Spot sizes from 1.2 mm to 10 µm.

Redirecting to Chemical Concentration Monitors Page

Fluid Control

Gas Concentration Monitoring

Vapor Concentration Monitor IR-300

In-line compact vapor concentration monitor, enables MOCVD precursor delivery to be stable.

Process Gas Monitoring

Compact Process Gas Monitor MICROPOLE System

Compact process gas monitor using quadrupole mass spectrometer. Monitors trace gases, responds quickly to process shift . Easy to install and maintain.

Thin Film Analysis/Control

New Uvisel 2

The ultimate solution to every challenge in thin film measurement

CMP Process


The LA-960 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the popular choice for most applications.

Non-Contact Temperature Measurement