In-situ spectroscopic ellipsometer for real-time thin film monitoring
The UVISEL Plus in-situ spectroscopic ellipsometer can be easily mounted on process chambers (PECVD, MOCVD, sputter, evaporation, ALD, MBE) for the real-time control of thin film deposition or etch processes.
The UVISEL Plus in-situ provides the unique combinations of very high speed, sensitivity, dynamic range and accuracy making the instrument able to control deposition / etch at the atomic layer thickness level, even for rapid processes.
Using our new adaptation kit it is possible to use the same ellipsometer for in-situ and benchtop application on a goniometer. Switching between the two configurations and aligning the system is extremely straightforward.
The UVISEL Plus in-situ ellipsometer is driven by the DeltaPsi2 software platform that is common to all HORIBA Jobin Yvon thin film metrology tools. The software provides real-time data acquisition and modelling / reprocessing capabilities. Advanced communication protocols including TCP/IP and RS232 have been designed for production environments and OEM needs.
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