Mass Flow Module
原子层沉积（ALD）是一种基于连续使用气相化学工艺的薄膜沉积技术。ALD 被认为是化学气相沉积的一个子类。多数 ALD 反应使用两种被称为“先驱物”的化学物质。先驱物相继以自限方式与材料表面反应。通过反复接触单独的先驱物，薄膜缓慢沉积。ALD 是制造半导体器件和纳米材料合成部分成套工具的关键工艺。
等离子体增强 ALD（PEALD）是一种将等离子体用于增强原子层沉积（ALD）过程并最终形成薄膜镀层的工艺。与标准 ALD 一样，PEALD 让特定的化学先驱物发生反应，同时也让射频等离子体进行循环，以更好地控制工艺中的化学反应。PEALD 确保了生产的高度一致性。此外，该工艺要求的温度比标准 ALD 低得多，以适应热敏材料。
原子层沉积（ALD）是一种基于连续使用气相化学工艺的薄膜沉积技术。ALD 被认为是化学气相沉积的一个子类。多数 ALD 反应使用两种被称为“先驱物”的化学物质。先驱物相继以自限方式与材料表面反应。通过反复接触单独的先驱物，薄膜缓慢沉积。ALD 是制造半导体器件和纳米材料合成部分成套工具的关键工艺。
等离子体增强 ALD（PEALD）是一种将等离子体用于增强原子层沉积（ALD）过程并最终形成薄膜镀层的工艺。与标准 ALD 一样，PEALD 让特定的化学先驱物发生反应，同时也让射频等离子体进行循环，以更好地控制工艺中的化学反应。PEALD 确保了生产的高度一致性。此外，该工艺要求的温度比标准 ALD 低得多，以适应热敏材料。
【Process Control Solutions】
With advances in microfabrication, keeping chambers clean after processing has become essential to improving productivity in semiconductor deposition processes. The IR-400 Series Chamber Cleaning Endpoint Gas Monitor measures exhaust gas components such as SiF4 and CF4 in real time, helping optimize dry-cleaning endpoint detection, reduce cleaning gas consumption and cycle time, and extend part life.
The MV-2000 High-performance Mixed Injection System Liquid Vaporizer is designed to vaporize pure water and liquid chemicals. Its high-efficiency tornado-flow mechanism enables stable low-temperature vaporization, delivering excellent performance even with thermally sensitive liquids. In addition, it supports higher flow rates within the same footprint and operating temperature range as previous models, eliminating the need for layout changes.
The Micropole System QL Series Quadrupole Mass Analyzer monitors residual H2O adsorbed on chamber walls as well as H2O desorbed during the baking process. By monitoring residual and process gases in the process chamber and measuring base pressure, it is ideal for controlling vacuum chamber conditions and monitoring processes.
By applying our proprietary concepts and advanced technologies to each vaporization method — bubbling, baking, and direct vaporization — we deliver high-performance vaporization systems that meet increasingly demanding customer requirements.
Stable Liquid Supply for Continuous Operation
Long-term continuous operation requires a stable liquid supply. The LU Series Liquid Auto Refill System ensures stable operation by precisely controlling pressure and temperature. For baking systems, it stabilizes liquid temperature to prevent fluctuations in the vaporization tank; for direct vaporization systems, it maintains optimal pressure during refilling.
Safe Source Tank Replacement
When handling toxic or flammable materials, safe tank replacement is critical. The LU Series includes a standard safety function that purges residual material from the piping and verifies that no material remains.
Uninterrupted Supply During Tank Replacement
A built-in sub-tank enables continuous liquid supply even during source tank replacement.
Software Information
Open Source Software
EtherCAT Communication
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