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蚀刻

蚀刻在微细制造中用于在制造过程中化学去除晶圆片表面的层。蚀刻是一个非常重要的工艺模块,每个晶圆在完成之前都要经过许多蚀刻步骤。

在许多蚀刻步骤中,晶圆片的一部分被一种抗蚀刻的“掩蔽”材料保护起来不受蚀刻剂的影响。在某些情况下,掩蔽材料是用光刻法制成的光刻胶。其他情况需要更耐用的掩膜,如氮化硅。

Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of ions (usually a plasma of reactive gases such as fluorocarbons, oxygen, chlorine, boron trichloride; sometimes with addition of nitrogen, argon, helium and other gases) that dislodge portions of the material from the exposed surface. A common type of dry etching is reactive-ion etching. Unlike with many (but not all, see isotropic etching) of the wet chemical etchants used in wet etching, the dry etching process typically etches directionally or anisotropically.

Fluid Controller & Module

GR-511F
详情 GR-511F

Wafer Back Side Cooling System

D700MG
详情 D700MG

High Speed & Precision Pressure Insensitive Mass Flow Module

D700WR
详情 D700WR

Wide Range Pressure Insensitive Mass Flow Module

DZ-100
详情 DZ-100

紧凑型质量流量控制器

FS-3000
详情 FS-3000

热式气体分流器

SEC-Z500X
详情 SEC-Z500X

多量程/多气体数字质量流量控制器

SEC-Z700S 系列
详情 SEC-Z700S 系列

新型压力补偿质量流量控制器

SEC-Z700X 系列
详情 SEC-Z700X 系列

压力补偿质量流量控制器

VC 系列
详情 VC 系列

直接液体注入系统

XF-100 系列
详情 XF-100 系列

数字式液体质量流量计

UR-Z700 系列
详情 UR-Z700 系列

数字式自动压力调节器

GR-300 系列
详情 GR-300 系列

晶圆背面冷却系统

HORIBA's expertise in analytical instrumentation has provided the foundations for a range of successful industrial monitoring tools for the semiconductor, pharmaceutical and chemical industries.

With its new compact design and enhanced image quality, the LEM interferometer for in-situ etch rate monitoring and end-point detection can be mounted on any process chamber with a direct top view of the wafer. It provides a real-time digital CCD image of the sample surface, making its 30-m laser beam positioning simple and accurate. Based on interferometry technique, the LEM provide in-situ etch/growth rate monitoring for endpoint detection of a wide range of dry etch applications.

Process Monitor & Endpoint Detector

VG-200S
详情 VG-200S

电容式压力计

EV 2.0 系列
详情 EV 2.0 系列

基于光发射光谱和 MWL 干涉测量法的工艺终点/反应腔健康监测

EV-140C
详情 EV-140C

光发射光谱蚀刻终点监测仪

IT-480 系列
详情 IT-480 系列

高精度红外温度计[固定式]

IT-270
详情 IT-270

High-Accuracy Infrared Thermometer [Built-in type]

LEM Series
详情 LEM Series

基于实时激光干涉测量的摄像头终点监测

RU-1000
详情 RU-1000

等离子体发射控制器

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