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Liquid Source Vaporization System

HORIBA 是高性能汽化器的供应商之一。HORIBA 液体源汽化器贯穿整个半导体制程,可以安全有效地将液体以气体形态输送至使用点。无论液体是需要在真空下还是常压下汽化,HORIBA 的汽化技术都能提供符合要求的汽化器。HORIBA 积累了 30 余年的汽化技术,分为直接注入、混合注入、鼓泡和烘烤汽化技术。

HORIBA 的液体源汽化器可以稳定有效地汽化液体物料。我们的汽化器还可以连接到 HORIBA 的自动供液系统,将汽化后的气体安全、连续地输送到使用点。由于液体储罐可在不中断制造过程的情况下更换,所以不会出现停机问题。

Advanced processes are stretching the boundaries of critical chemistry vaporization technology

Vaporization of critical process chemistries is not an easy task. To begin with, advanced processes are constantly changing and using novel chemistries for which data may be limited. In some instances, researchers may need vaporization equipment for chemistries whose identities they don’t want to disclose. Once the chemical properties are determined, the job of balancing liquid flows, carrier gas flows, upstream and downstream pressures and materials compatibility can start. Often a carrier gas is required, and the carrier flow must be carefully calculated and controlled during process. The temperature of the vaporizers is also key – balancing the required temperature vs the potential to heat-induced damage to the liquid.  The determination of the right vaporization method leads to the careful selection and specification of the supporting instruments – gas / liquid flow controllers / meters, vaporization nozzles and temperature controllers. Not an easy process but a process in which HORIBA is a global leader.

Vaporization Carrier Gas
Direct Vaporization

HORIBA has vaporization solutions ranging from fractional grams/minute to >25g/min. As a solutions provider, we can not only recommend vaporization components like our VC and MV series but we can also provide a fully integrated system like our LSC / LU. By using our world-leading gas and liquid mass flow controllers and meters in conjunction with our vaporizers, users are assured accurate and repeatable vaporization of critical process chemistries. 

Triple Point

The graph in the left shows the different possible states of matter. There are two ways to get from a liquid to a gaseous state. The first method involves increasing the temperature while holding the pressure steady, as indicated by the arrow with the broken line broken line. This method is commonly used in everyday settings—to boil water and convert it to steam, for example. Heating a liquid takes time, however, which makes rapid vaporization difficult. On the other hand, one can also heat the liquid in advance and then abruptly reduce the pressure, as illustrated by the arrow with the solid line Solid line. The pressure in the vaporization section of the injector can be reduced instantaneously, and this makes it possible to vaporize a liquid source instantaneously.

Principle of Vaporization

Injection Method

The following list covers the major steps involved in vaporizing a liquid source and supplying it to the process chamber.

  1. The liquid source's flow rate is measured, and the amount of liquid is feedback controlled by the valve.

  2. The liquid is instantaneously and completely vaporized.

  3. The gas is released without being allowed to condense back into its liquid form.

Vaporization systems that use the injection method sequentially carry out steps 1, 2 and 3 listed above. The VC series units measure the liquid flow of the liquid source using a mass flow meter, and do not use a carrier gas. The MI/MV series units use a mass flow meter for measurement, and feature a mass flow controller that introduces a carrier gas into the unit to vaporize the liquid source.

Gas and Liquid Mixture Method

This vaporization method is used in the MI/MV series. Since the pressure of the carrier gas is higher ahead of the nozzle inside the injector, it can be heated efficiently. The liquid source and the heated carrier gas are mixed together in the gas/liquid mixing area just before the nozzle, the pressure is reduced as they pass through the nozzle, which vaporizes the mixture.
Vaporization efficiency is higher than with traditional vaporization methods. When this method is used, larger flows can be generated, and the generation temperature can be reduced.

Optimal vaporization methods for different liquids

In semiconductor devices, which continue to require greater integration and detail, a variety of liquid sources are used to accentuate the characteristics of the films created. HORIBA STEC offers vaporization systems that are optimized to make the most of the characteristics of the various liquid sources used in today's cutting-edge processes.

See HORIBA's Liquid Source Vaporization System


MV-2000 系列
MV-2000 系列


LSC 系列
LSC 系列


VC 系列
VC 系列


LE 系列
LE 系列


LU 系列
LU 系列


XF-100 系列
XF-100 系列


LF-F/LV-F 系列
LF-F/LV-F 系列




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