In-situ Thin Films Process Control

Jean Canteloup* Jean-Phillippe Vassilakis* Eric Fluck* Pascal Amary* | |   技術論文

 *Instruments S.A. JOBIN YVON-SOFIE Division

The need for in-situ process control led to the creation of SOFIE Instruments company. Sofie was founded in 1983 as a spin-off from two French organizations, the University of Orsay and CIT Alcatel (Semiconductor Division). SOFIE’s primary activity consists of the study, development and manufacturing of instruments for in-situ thin film process control and analysis utilizing techniques such as Optical Emission Spectroscopy, Interferometry and Imaging, Ellipsometry, and Langmuir Probes.
Sofie products are constantly evolving, driven by the innovations of their engineers working in collaboration with customers. The new ideas developed at Sofie on sensors and analytical methods are protected by numerous international patents. The competitive edge of our products is based on the originality of the architecture, smart sensor technology, analytical methodology, and unique signal processing.