Development of Substrate Temperature Monitoring System for High-Accuracy Plasma Process

By: Takayoshi TSUTSUMI*

2019年4月11日


Figure 2 Optical interferometer for wafer temperature monitoring system

Feature Article

Author(*) Information: Assistant Professor,Plasma Nanotechnology Research Center,Nagoya University,Ph.D.

To achieve the atomic level plasma process, the wafer temperature is considered to be one of the most important disturbances. However, there is no useful method to monitor the wafer temperature during plasma process. We developed a noncontact wafer temperature measurement technique using optical interferometry. The robustness of performance against disturbances has been markedly improved.

 

 

Download PDF (1.8 MB)